The Process Of Ion Plating

The process of ion plating is as follows:

The evaporation source is connected with the anode, and the workpiece is connected with the cathode. After passing three to five thousand volts high voltage DIRECT current, glow discharge is generated between the evaporation source and the workpiece. Because the vacuum cover is filled with inert argon, part of the argon is ionized under the action of the discharge electric field, and a plasma dark region is formed around the cathode workpiece. The positive charge argon ion is attracted by the negative high pressure of the cathode and bombards the surface of the workpiece fiercely, causing the particles and dirt on the surface of the workpiece to be blasted out, so that the surface of the workpiece to be plated has been fully cleaned by ion bombardment. Then, the ac power supply of the evaporation source is connected, and the evaporating material particles melt and evaporate, enter the glow discharge zone, and are ionized. With positive charge evaporation material ions, under the cathode attraction, along with argon ions rushed to the workpiece, when the evaporation material ions on the surface of the workpiece exceeds the number of splash ions, gradually accumulated to form a layer of solid adhesion to the surface of the workpiece coating. This is the simple process of ion plating.

IKS PVD company, decorative coating machine, tools coating machine, DLC coating machine, optical coating machine, PVD vacuum coating line, the turn-key project is available. Contact us now, E-mail: iks.pvd@foxmail.com